RAM-E Series
Remote Air Module - Enhanced

Semifab RAM-E units deliver precision controlled airflow to large tool-specific mini-environments and enclosures. These high performance units provide accurate, controlled airflow and are sized to compensate for potential pressure losses due to auxiliary chemical filtration.

For photolithography tools, RAM-E modules create stable, controlled point-of-process environments ensuring maximum resist uniformity. Airflow of up to 4000 cubic feet per minute supports the rigorous requirements of Deep UV processing and is also available with a Low-K option.

With this kind of performance and features, Semifab RAM-E modules are today's solution for tomorrow's stringent process requirements.