Semifab RAM-E units deliver precision controlled airflow to large
tool-specific mini-environments and enclosures. These high performance units
provide accurate, controlled airflow and are sized to compensate for potential
pressure losses due to auxiliary chemical filtration.
For photolithography tools, RAM-E modules create stable, controlled
point-of-process environments ensuring maximum resist uniformity. Airflow of
up to 4000 cubic feet per minute supports the rigorous requirements of Deep
UV processing and is also available with a Low-K option.
With this kind of performance and features, Semifab RAM-E modules
are today's solution for tomorrow's stringent process requirements.